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Fabrication and characterization of a dynamically flat high resolution micro-scanner

: Hsu, S.; Klose, T.; Drabe, C.; Schenk, H.


Journal of Optics. A (2008), Nr.10, Paper 044005, 8 S.
ISSN: 1464-4258
Fraunhofer IPMS ()

We present an ultra flat high frequency micro-scanner for high resolution laser projection applications. The scanner is fabricated in silicon-on-insulator wafers with a 30 mu m thick device layer. A backside island is constructed behind the mirror plate to improve the rigidity. The backside island is done with a deep reactive ion etching (DRIE)-tetramethylammonium hydroxide (TMAH) combination process to achieve a height of 86 mu m with good uniformity (4% within-wafer non-uniformity). The dynamic deformation is measured with a stroboscopic interferometer. The 1 mm diameter mirror plate has a root-mean-square deformation of less than 27 nm if operated at 30.84 kHz and a mechanical scan angle of +/- 10 degrees.. The dynamic flatness performance of the device exceeds the optical quality requirement of