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Upscaling of texture-etched zinc oxide substrates for silicon thin film solar cells

: Müller, J.; Schöpe, G.; Kluth, O.; Bech, R.; Ruske, M.; Trube, J.; Szyszka, B.; Jiang, X.; Bräuer, G.


Thin solid films 392 (2001), Nr.2, S.327-333
ISSN: 0040-6090
International Conference on Coatings on Glass (ICCG) <3, 2000, Maastricht>
Konferenzbeitrag, Zeitschriftenaufsatz
Fraunhofer IST ()
silicon; solar cell; sputtering; zinc oxide

Large area glass/ZnO-films were prepared by high-rate dc magnetron sputtering from ceramic targets and compared to lab-type rf- and mf-sputtered ZnO. The initially smooth films exhibit excellent electrical (resistivity < 5x10-4) omega cm) and optical (transmission > 80 % for visible light and 1500 nm thick films) properties and develop a surface texture upon etching in diluted hydrochloric acid. Independent of sputter technique (dc or rf) and substrate size, higher substrate temperatures and lower sputter gas pressures have a similar influence on the film structure and lead to more robust and etch-resistant films. Showing excellent light scattering properties, amorphous silicon pin solar cells prepared on these large area glass/ZnO samples exhibit initial efficiencies up to 9.2 % proving the viability of sputtered and texture-etched ZnO as TCO-substrate for industrial solar module production.