Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

Sputter deposition of silicon oxynitride gradient and multilayer coatings

: Weber, J.; Bartzsch, H.; Frach, P.


Applied optics 47 (2008), Nr.13, S.C288-C292
ISSN: 0003-6935
ISSN: 1539-4522
ISSN: 1559-128X
Fraunhofer FEP ()
deposition and fabrication; materials

The optical properties of silicon oxynitride films deposited by reactive d.c. magnetron sputtered films have been investigated. In particular the absorption characteristics of silicon nitride thin films in the visible spectrum (VIS) and their optical bandgap were analyzed regarding their composition and deposition properties. It could be shown that there is a significant difference between the absorption in the visible spectrum and the optical bandgap for these layers. Furthermore the influence of the unipolar and the bipolar pulse mode on the optical layer properties is presented.
The extinction coefficient for silicon nitride single layers could be reduced to a value of 2E-4 at 500 nm without external heating. There is also a dependency of the absorption of silicon oxynitride layers on the discharge voltage. Moreover the resulting spectra of rugate and edge filters consisting of these layers are shown, offering lower absorption than single layers.