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P implantation into preamorphized germanium and subsequent annealing: Solid phase epitaxial regrowth, P diffusion, and activation
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2008
Journal Article
Titel
P implantation into preamorphized germanium and subsequent annealing: Solid phase epitaxial regrowth, P diffusion, and activation
Author(s)
Posselt, M.
Schmidt, B.
Anwand, W.
Grötzschel, R.
Heera, V.
Mücklich, A.
Wündisch, C.
Skorupa, W.
Hortenbach, H.
Gennaro, S.
Bersani, M.
Giubertoni, D.
Möller, A.
Bracht, H.
Zeitschrift
Journal of vacuum science and technology B. Microelectronics and nanometer structures
DOI
10.1116/1.2805249
Language
English
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