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The structure of Mo/Si multilayers prepared in the conditions of ionic assistance

: Zubarev, E.N.; Kondratenko, V.V.; Sevryukova, V.A.; Yulin, S.A.; Feigl, T.; Kaiser, N.


Applied physics. A 90 (2008), Nr.4, S.705-710
ISSN: 0340-3793
ISSN: 0721-7250
ISSN: 0947-8396 (Print)
ISSN: 1432-0630 (Online)
Fraunhofer IOF ()
molybdenum-silicon multilayer; superlattice; deposition; transition; mirror; stress; zone

The influence of a negative substrate-applied bias potential on the structure of periodic Mo/Si multilayer compositions has been investigated by means of cross-sectional electron microscopy, small-angle X-ray reflectivity, X-ray diffraction and by modeling the small-angle spectra. It is known that the crystalline structure of molybdenum layers is the main source of interface roughness. In the absence of a bias potential application, the interface roughness tends to develop from the substrate towards the surface of a Mo/Si multilayer composition. A negative bias potential (up to -200 V) applied to a substrate during silicon layer deposition leads to smoother interfaces and improves the layer morphology. After increasing the bias potential over -200 V a considerable growth of an amorphous interlayer transition zone can be observed at Si-on-Mo interfaces. By raising the bias potential during the deposition of Mo layers a development of roughness at Mo-on-Si interfaces as well as growing interlayer thicknesses were found.