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Simulation and optimization of holographically exposed photoresist gratings

 
: Zanke, C.; Gombert, A.; Erdmann, A.; Weiss, M.

Singh, K. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.; Optical Society of India:
Selected papers from International Conference on Optics and Optoelectronics '98 : Silver Jubilee symposium of the Optical Society of India ; 9 - 12 December 1998, Dehradun, India. Proceedings
Bellingham/Wash.: SPIE, 1998 (SPIE Proceedings Series 3729)
ISBN: 0-8194-3203-2
S.244-249
International Conference on Optics and Optoelectronics (ICOL) <1998, Dehra Dun>
Englisch
Konferenzbeitrag
Fraunhofer IIS B ( IISB) ()
Mikrolithographie; simulation; holographisches Gitter; Mottenauge

Abstract
Standard approaches of lithographic process simulation have been applied to the simulation of holographically exposed photoresist gratings. Fine tuning of the photoresist development parameters results in a good agreement of simulated and experimentally obtained photoresist profiles. Several conclusions with respect to the optimization of process and photoresist parameters for the fabrication of user defined photoresist profiles are drawn.

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