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Simulation of optical lithography

 
: Erdmann, A.; Henke, W.

Singh, K. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.; Optical Society of India:
Selected papers from International Conference on Optics and Optoelectronics '98 : Silver Jubilee symposium of the Optical Society of India ; 9 - 12 December 1998, Dehradun, India. Proceedings
Bellingham/Wash.: SPIE, 1998 (SPIE Proceedings Series 3729)
ISBN: 0-8194-3203-2
S.480-494
International Conference on Optics and Optoelectronics (ICOL) <1998, Dehra Dun>
Englisch
Konferenzbeitrag
Fraunhofer IIS B ( IISB) ()
Mikrolithographie; simulation

Abstract
Simulation of photolithographic processes is widely used in semiconductor research and industry. The paper reviews physical models and capabilities of modern lithography simulators. Application of these simulation techniques to the manufacturing of microelectronic, optical and micro-optical components are discussed.

: http://publica.fraunhofer.de/dokumente/N-6853.html