English
Deutsch
Log In
Password Login
or
Log in with Fraunhofer Smartcard
Research Outputs
Projects
Researchers
Institutes
Statistics
Fraunhofer-Gesellschaft
Home
Fraunhofer-Gesellschaft
Artikel
Optimized fabrication of silicon nanofocusing x-ray lenses using deep reactive ion etching
Details
Full
Export
Statistics
Options
2007
Journal Article
Titel
Optimized fabrication of silicon nanofocusing x-ray lenses using deep reactive ion etching
Author(s)
Kurapova, O.
Lengeler, B.
Schroer, C.G.
Küchler, M.
Gessner, T.
Hart, A. van der
Zeitschrift
Journal of vacuum science and technology B. Microelectronics and nanometer structures
DOI
10.1116/1.2769361
Language
English
google-scholar
View Details
Fraunhofer-Institut für Zuverlässigkeit und Mikrointegration IZM