Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

Plasma for surface technology - examples of current developments

: Bräuer, G.; Diehl, W.; Frach, P.; Kirchhoff, V.; Sittinger, V.; Szyszka, B.; Vergöhl, M.

Society of Vacuum Coaters -SVC-, Albuquerque/NM:
Society of Vacuum Coaters. Technical Conference Proceedings 1991-2007. CD-ROM
Albuquerque: SVC, 2007
Society of Vacuum Coaters (Annual Technical Conference) <50, 2007, Louisville/KY>
Fraunhofer IST ()

High volume plasma discharges nowadays are the key for economic deposition of thin films on plane (e.g. glass sheets) or shaped substrates. During the past 30 years plasma based physical and chemical vapour deposition processes have established in numerous fields of applications. Pulsed plasma plays an important role in research and industry since about 15 years. Pulse magnetron sputtering has opened the door for long term stable and high rate deposition of insulating materials on large areas. High Power Impulse Magnetron Sputtering (HIPIMS) is the key to very high plasma densities (ionization degree around 0.5) and thus improved film structures. Current research work also focuses on atmospheric plasma based on dielectric barrier discharges. Such plasma sources are rather simple and can be easily scaled up. Typical applications are cleaning or modification of flat surfaces as well as the treatment of inner surfaces of hollow microparts. In this contribution we will report on some examples of current research work on plasma discharges for surface technology.