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Well design in a bulk CMOS technology with low mask count
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2006
Conference Paper
Titel
Well design in a bulk CMOS technology with low mask count
Author(s)
Jank, M.P.M.
Kandziora, C.
Frey, L.
Ryssel, H.
Hauptwerk
Ion Implantation Technology. 16th International Conference on Ion Implantation Technology, IIT 2006
Konferenz
International Conference on Ion Implantation Technology (IIT) 2006
DOI
10.1063/1.2401476
Language
English
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Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB