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Effect of metal organic vapor phase epitaxy growth conditions on emission wavelength stability of 1.55 mu m quantum dot lasers

: Franke, D.; Moehrle, M.; Boettcher, J.; Harde, P.; Sigmund, A.; Kuenzel, H.


Applied Physics Letters 91 (2007), Nr.8, Art. 081117, 3 S.
ISSN: 0003-6951
ISSN: 1077-3118
Fraunhofer HHI ()
room temperature; amplifier; diffusion

InAs quantum dots (QDs) on InP were implemented as active layers in laser structures completely grown by metal organic vapor phase epitaxy (MOVPE). In laser structures due to growth of the upper InP cladding layers onto the QDs, a marked blueshift of the emission wavelength and a simultaneous degradation of photoluminescence intensity were observed. This behavior was systematically investigated using thermal treatment to simulate the growth of the upper cladding layer. Using an adequate growth procedure emission behavior was achieved that has proven to be fairly insensitive to over-/regrowth steps. Broad-area 1.55 mu m emitting laser devices were fabricated by incorporating seven QD layers in an all-MOVPE grown structure. Transparency current densities per dot layer of 80 A cm(-2) were achieved which is close to values of multiple quantum well lasers processed in the same way.