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Broadband scatterometry at extreme ultraviolet wavelengths for nanograting characterization

: Ghafoori, Moein; Bahrenberg, Lukas; Glabisch, Sven; Schröder, Sophia; Danylyuk, Serhiy; Brose, Sascha; Stollenwerk, Jochen; Juschkin, Larissa; Loosen, Peter


Adan, Ofer (Ed.) ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV : 22-27 February 2021, Online Only, California, United States
Bellingham, WA: SPIE, 2021 (Proceedings of SPIE 11611)
Paper 116112F, 13 S.
Conference "Metrology, Inspection, and Process Control for Semiconductor Manufacturing" <35, 2021, Online>
Fraunhofer ILT ()
critical dimension metrology; model-based reconstruction; finite element method; nanograting inspection; diffraction order measurements

The authors present a novel approach for the structural characterization of periodic nanostructures using spectrally resolved broadband scatterometry in the extreme ultraviolet (EUV) wavelength range. The implemented metrology method combines 0th and ±1st diffraction order spectrum measurements of a nanograting under broadband illumination from 8 nm to 17 nm for the model-based reconstruction of geometrical grating parameters. For the experimental investigations, a compact stand-alone scatterometer setup is designed and realized. The setup enables measurements of spectrally resolved0th and ±1st diffraction orders of a grating that is illuminated at various grazing incidence angles. The acquired data serves as a basis for the reconstruction of the grating’s geometry using rigorous optical finite element method (FEM). The method is applied to arrays of lines and spaces with sub-100 nm feature size.