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Instrument for the Measurement of EUV Reflectance and Scattering - MERLIN

: Schröder, S.; Kamprath, M.; Gliech, S.; Duparre, A.; Tünnermann, A.

Kaiser, N. ; Optical Society of America -OSA-, Washington/D.C.; European Optical Society -EOS-; Society of Vacuum Coaters -SVC-, Albuquerque/NM:
Optical Interference Coatings 2007. CD-ROM : Topical Meeting and Tabletop Exhibit, Tucson, June 3-8, 2007. Technical digest
Washington, DC: OSA, 2007
ISBN: 1-55752-841-1
Optical Interference Coatings Topical Meeting and Tabletop Exhibit (OIC) <2007, Tucson/Ariz.>
Fraunhofer IOF ()
instrumentation; measurement; metrology; thin films; optical properties

A new system is presented for measurements of angle resolved scatter and reflectance at 13.5 nm
in the extreme ultraviolet spectral range. The system enables the at-wavelength characterization of EUV optical
components. Examples are presented for Mo/Si multilayers deposited onto super polished substrates.