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Determination of plasma parameters during deposition of ZnO films by ceramic and metallic targets and correlation with film properties

: Wiese, R.; Kersten, H.; Hannemann, M.; Sittinger, V.; Ruske, F.; Menner, R.


Cavaleiro, A.:
Plasma surface engineering, PSE 2006 : Proceedings of the Tenth International Conference on Plasma Surface Engineering; Garmisch-Partenkirchen, Germany, September 10-15, 2006
Weinheim: Wiley-VCH, 2007 (Plasma processes and polymers 4.2007, Nr.S1)
ISBN: 978-3-527-32016-5
International Conference on Plasma Surface Engineering (PSE) <10, 2006, Garmisch-Partenkirchen>
Konferenzbeitrag, Zeitschriftenaufsatz
Fraunhofer IST ()
deposition; film; langmuir problem; magnetron; process control; pulsed discharge; sputtering

While magnetron sputtering is a commonly used tool for the deposition of thin films in research and production, the development of suitable models describing film growth on the substrate progresses slowly. One of the major reasons is the complexity of the process, in which energy and particles are delivered to the substrate in a variety of ways. Nevertheless, these effects are essential for film growth and will determine the quality of obtained films. In this article, an example for the characterization of a deposition process with a comparably simple and cost effective method is shown. The total energy flux to the substrate was measured by a thermal probe; plasma parameters were studied by means of Langmuir probe measurements.