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Investigations into composition and structure of DBD-deposited amino group containing polymer layers

: Borris, J.; Thomas, M.; Klages, C.-P.; Faupel, F.; Zaporojtchenko, V.


Cavaleiro, A.:
Plasma surface engineering, PSE 2006 : Proceedings of the Tenth International Conference on Plasma Surface Engineering; Garmisch-Partenkirchen, Germany, September 10-15, 2006
Weinheim: Wiley-VCH, 2007 (Plasma processes and polymers 4.2007, Nr.S1)
ISBN: 978-3-527-32016-5
International Conference on Plasma Surface Engineering (PSE) <10, 2006, Garmisch-Partenkirchen>
Konferenzbeitrag, Zeitschriftenaufsatz
Fraunhofer IST ()
amino functionalization; atmospheric pressure plasma; barrier; DBD; dielectric barrier discharge; plasma treatment; surface; surface modification

Amino group containing films of maximum 30 nm thickness were deposited on gold-coated wafers using atmospheric pressure dielectric barrier discharges (DBD) and process gases consisting of aminopropyl-trimethoxysilane (APTMS) as precursor in combination with various carrier gases including nitrogen, helium, argon, or a mixture of ammonia and nitrogen. With CD-XPS a concentration [NH2]/[C] of up to almost 6% was found. Storage of the films in air for four weeks generally led to a considerable reduction of the primary amino group concentration; however, in the case of the films produced using ammonia in nitrogen as carrier gas the concentration remained stable at just under 4%. Oxidation products according to XPS and IR data include amides and nitriles though imines may also be present.