Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

Mo/Si multilayers with different barrier layers for applications as EUV mirrors

: Braun, S.; Mai, H.; Moss, M.; Scholz, R.


Japan Society of Applied Physics -JSAP-; IEEE Electron Devices Society:
Microprocesses and nanotechnology 2001. Digest of papers : 2001 International Microprocesses and Nanotechnology Conference, October 31 - November 2, 2001, Matsue-shi, Shimane, Japan
Tokyo: Business Center for Academic Societies Japan, 2001
ISBN: 4-89114-017-8
International Microprocesses and Nanotechnology Conference (MNC) <2001, Matsue>
Fraunhofer IWS ()
diffusion barriers; interface structure; mirrors; molybdenum; optical multilayers; pulsed laser deposition; reflectivity; silicon; sputter deposition; ultraviolet spectra

Summary form only given. Pulsed laser deposition (PLD) and magnetron sputter deposition have been used to prepare different types of Mo/Si multilayers for the EUV spectral range, First of all, the pure Mo/Si system without any additional components has been investigated. The different growth mechanisms of the layers induced by the alternative deposition methods are discussed and the resulting reflectivities and microstructures are compared. Various materials (e.g. C, B(sub 4)C, Ag, W) were tested as barrier layers at the Mo-Si interface. We have investigated their influence on reflectivity and morphology of the resulting multilayer structures.