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Projection mask-less lithography (PML2): First results from the multi beam blanking demonstrator
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2006
Conference Paper
Titel
Projection mask-less lithography (PML2): First results from the multi beam blanking demonstrator
Author(s)
Eder-Kapl, S.
Haugeneder, E.
Langfischer, H.
Reimer, K.
Eichholz, J.
Witt, M.
Doering, H.-J.
Heinitz, J.
Brandstätter, C.
Hauptwerk
31st International Conference on Micro- and Nano-Engineering 2005. Proceedings
Konferenz
International Conference on Micro- and Nano-Engineering (MNE) 2005
DOI
10.1016/j.mee.2006.01.246
Language
English
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Fraunhofer-Institut für Siliziumtechnologie ISIT