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Noncritical waveguide alignment for vertically coupled microring using a mode-expanded bus architecture

 
: Tee, C.W.; Williams, K.A.; Penty, R.V.; White, I.H.; Hamacher, M.

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IEEE Photonics Technology Letters 18 (2006), Nr.20, S.2129-2131
ISSN: 1041-1135
Englisch
Zeitschriftenaufsatz
Fraunhofer HHI ()

Abstract
Vertically coupled microrings in an all-pass filter configuration are fabricated with a range of waveguide misalignments deliberately introduced into the lithography masks to demonstrate noncritical fabrication requirements. The microrings have a mode-expanded bus design which allows a greatly reduced variation in power coupling coefficient-only 6% for fabrication misalignments as high as 1 µm. This represents a five-fold improvement in fabrication tolerance when compared with conventional designs.

: http://publica.fraunhofer.de/dokumente/N-59668.html