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Picosecond laser source at 3.4 microns for laser material processing of polymers

: Nyga, S.; Jungbluth, B.; Elsen, F.; Röhrig, A.; Hoffmann, H.-D.


Clarkson, W.A. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Solid State Lasers XXIX: Technology and Devices : 4-6 February 2020, San Francisco, California
Bellingham, WA: SPIE, 2020 (Proceedings of SPIE 11259)
ISBN: 978-1-5106-3281-3
ISBN: 978-1-5106-3282-0
Paper 112590D, 7 S.
Conference "Solid State Lasers - Technology and Devices" <29, 2020, San Francisco/Calif.>
Fraunhofer ILT ()

We present a laser beam source with average output powers of up to 15 W and pulse energies of up to 50 μJ at a wavelength of 3.4 μm based on a frequency converted ultrashort pulse laser. The laser beam source consists of a commercially available ultrashort pulse laser with a pulse duration of 10 ps and a downstream multi-stage optical parametric frequency converter based on large-aperture PPLN crystals. Different output powers, pulse energies, conversion efficiencies and beam qualities are achieved depending on the design of the multi-stage setup. In addition, we present some results of processing experiments on different polymer films obtained with the laser beam source presented here.