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Silicon Nitride, Silicon Dioxide and Emerging Dielectrics

Proceedings of the Symposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films and Emerging Dielectrics, Part of the 211th Meeting of the Electrochemical Society, Chicago, Illinois, May 6-10, 2007
 
: Sah, R.E.; Deen, M.J.; Zhang, J.F.; Yota, J.; Kamakura, Y.
: Electrochemical Society -ECS-, Dielectric Science and Technology Division

New Jersey: Electrochemical Society, 2007, XII, 847 S.
ECS transactions, 6, 3
International Symposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films, and other Emerging Dielectrics <9, 2007, Chicago/Ill.>
Electrochemical Society (Meeting) <211, 2007, Chicago/Ill.>
ISBN: 978-1-56677-552-6
Englisch
Tagungsband
Fraunhofer IAF ()

: http://publica.fraunhofer.de/dokumente/N-58592.html