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Laboratory-based EUV spectroscopy for the characterization of thin films, membranes and nanostructured surfaces

 
: Bahrenberg, Lukas; Glabisch, Sven; Ghafoori, Moein; Brose, Sascha; Danylyuk, Serhiy; Stollenwerk, Jochen; Loosen, Peter

:

Itani, T. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
International Conference on Extreme Ultraviolet Lithography 2019 : 15-19 September 2019, Monterey, California
Bellingham, WA: SPIE, 2019 (Proceedings of SPIE 11147)
Paper 111471X, 6 S.
International Conference on Extreme Ultraviolet Lithography <2019, Monterey/Calif.>
Englisch
Konferenzbeitrag
Fraunhofer ILT ()
metrology; EUV; spectroscopy; thin film

Abstract
The authors present studies on laboratory-based spectroscopy in the extreme ultraviolet (EUV) performed on a variety of thin film materials. This work focuses on spectroscopic measurements of EUV reflectivity and transmittance at wavelengths between 10 nm and 15 nm. The presented applications of the technique include the reconstruction of optical constants for novel materials such as EUV photoresists and absorbers, the characterization of EUV pellicles and ultrathin layer systems as well as the characterization of nanostructured surfaces.

: http://publica.fraunhofer.de/dokumente/N-565075.html