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In Situ Solar Wafer Temperature Measurement during Firing Process via Inline IR Thermography

: Ourinson, D.; Emanuel, G.; Csordás, A.; Dammaß, G.; Müller, H.; Sternkiker, C.; Clement, F.; Glunz, S.W.

Volltext ()

Physica status solidi. Rapid research letters 13 (2019), Nr.10, Art. 1900270, 6 S.
ISSN: 1862-6254
ISSN: 1862-6270
Zeitschriftenaufsatz, Elektronische Publikation
Fraunhofer ISE ()
Photovoltaik; Silicium-Photovoltaik; Metallisierung und Strukturierung; firing; measurement; thermography; assurance; belt furnace

Herein, an inline IR thermography system as an innovative application for real‐time contactless temperature measurement of wafers—both metallized and nonmetallized-during the firing process is successfully realized in an industrial firing furnace as proof of concept and example for a thermography system in a conveyor furnace. As observed by the new system, thermocouples (TCs) seem to measure lower temperature on wafers-especially in combination with TC frames-than wafers exhibit at standard firing conditions (here up to ΔT ≈ 40 K). Furthermore, highly resolved spatial temperature distribution can be successfully measured on the wafer.