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Fluid Dynamic Modeling and Flow Visualization of an Industrial Wet Chemical Process Bath

 
: Mohr, L.; Krick, T.; Zimmer, M.; Röder, T.; Müller, C.

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IEEE transactions on semiconductor manufacturing 32 (2019), Nr.3, S.334-340
ISSN: 0894-6507
ISSN: 1558-2345
Englisch
Zeitschriftenaufsatz
Fraunhofer ISE ()

Abstract
Simulating the fluid flow during a wet chemical process bath, allows for a deeper understanding of the flow conditions in the reaction basin. To validate the simulation, dye visualization as well as laser doppler velocimetry (LDV) and particle image velocimetry (PIV) were carried out for the first time in a transparent replica. Dye experiments led to a qualitative validation of the simulation model, as vortices and direction of rotation were detected in the basin. In summary, the repeated experiments show a good agreement with the simulation that there are areas in the basin where high relative standard deviations occur, mostly in areas with a very low velocity. The LDV velocity is higher compared to the theoretical velocity, while the simulation and PIV measurements match the theoretical value. The PIV measurements are in better agreement with the simulation, since the mean velocity in the z-direction is 0.0039 m/s and 0.0033 m/s for the PIV and the simulation, respectively. The PIV results show a change in the velocity direction with time, which can also be seen in the simulation results. The PIV measurements therefore confirm the simulation results of a time-dependent change in the flow.

: http://publica.fraunhofer.de/dokumente/N-558382.html