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Large-area UV-processing with a novel 248nm line beam system

 
: Delmdahl, Ralph; Trenn, Matthias; Hördemann, Christian; Gillner, Arnold

:

Kaierle, S. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
High-Power Laser Materials Processing: Applications, Diagnostics, and Systems VIII : 5-7 February 2019, San Francisco, California, United States
Bellingham, WA: SPIE, 2019 (Proceedings of SPIE 10911)
ISBN: 978-1-5106-2465-8
ISBN: 978-1-5106-2464-1
Paper 1091106, 10 S.
Conference "High-Power Laser Materials Processing - Applications, Diagnostics, and Systems" <8, 2019, San Francisco/Calif.>
Englisch
Konferenzbeitrag
Fraunhofer ILT ()
excimer laser; line-beam; CFRP; phase change material

Abstract
A novel UV line beam system for large area processing is introduced. The linear beam concept dispenses with movable components such as scanner optics. By using a fixed line beam with ns pulse duration and combining it with a 150 Wexcimer laser as the beam source a system with optimum reproducibility of the resulting layer modification has been created. Depending on the application, the excimer laser beam can be redirected into a high-resolution mask ablation system with rectangular field geometry. This machine’s modular concept can be used for a wide range of materials and laser-processes, especially for large area applications. Two different laser-material processes, thermal ablation and optical modification, are presented demonstrating the variety of the possible functionality of the system.

: http://publica.fraunhofer.de/dokumente/N-548892.html