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PECVD-AlOx

 
: Saint-Cast, P.; Hofmann, M.

:

John, J.:
Surface passivation of industrial crystalline silicon solar cells
Stevenage: IET, 2018 (IET power and energy series 106)
ISBN: 978-1-78561-246-6
ISBN: 978-1-78561-247-3
ISBN: 1-78561-246-8
S.51-68
Englisch
Aufsatz in Buch
Fraunhofer ISE ()
Photovoltaik; Silicium-Photovoltaik; Oberflächen: Konditionierung; Passivierung; Lichteinfang; oxide; PECVD; passivation

Abstract
The authors review developments in the use of PECVD in the growth of AlOx layers for solar cells. They consider the microwave PECVD and inductively coupled plasma PECVD methods, and the characteristics of layers grown by the 2 techniques, Si surface passivation, and solar cell applications.

: http://publica.fraunhofer.de/dokumente/N-548849.html