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Comparison of reliability of 100 nm AlGaN/GaN HEMTs with T-gate and SAG-gate technology

 
: Dammann, Michael; Baeumler, Martina; Brueckner, Peter; Kemmer, Tobias; Konstanzer, Helmer; Graff, Andreas; Simon-Najasek, Michél; Quay, Rüdiger

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Microelectronics reliability 88-90 (2018), S.385-388
ISSN: 0026-2714
Englisch
Zeitschriftenaufsatz
Fraunhofer IAF ()
Fraunhofer IMWS ()
GaN; AlGaN/GaN; HEMT; lifetime; reliability; TEM; electroluminescence; DC-Stress; arrhenius plot; 100 nm gate length; passivation; gate technology

Abstract
The effect of gate technology and semiconductor passivation on the switching speed and device reliability has been investigated. By reducing the parasitic capacitances and reducing the passivation induced surface charge density a median lifetime of around 106 h at a channel temperature of 125 °C and a current-gain cut-off frequency of 74 GHz for a T-gate technology has been achieved. By electroluminescence and TEM cross-sectioning of a stressed device a local inhomogeneous pit formation process was found as the major degradation mechanism for the decrease of the saturation current.

: http://publica.fraunhofer.de/dokumente/N-537477.html