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Deep surface relief grating in azobenzene-containing materials using a low-intensity 532 nm laser

: Sakhno, Oksana; Goldenberg, Leonid; Wegener, Michael; Stumpe, Joachim


Optical Materials: X 1 (2019), Art. 100006, 7 S.
ISSN: 2590-1478
Fraunhofer IAP ()
surface relief grating; holographic exposure; Azobenzene-containing material; glassy material

The inscription of deep surface relief grating (SRG) in glassy monomeric azobenzene materials using a low intensity diode pumped solid state (DPSS) laser operating at 532 nm is demonstrated. Previously developed epoxy-based star-like azobenzene-containing material was applied. Both deep SRG and multi-dimensional structures can be fabricated using this cheap, effective material in combination with a low cost laser source. The dependencies of the SRG performance (amplitude, inscription rate, stability) on exposure conditions (time, intensity) and layer thickness are presented. The replication of the inscribed gratings using polydimethylsiloxane is demonstrated. The results show that effective all-optical fabrication of surface relief master-gratings can be realized using low cost chemistry and widely used low-intensity coherent light source operating at 532 nm.