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Calibrated reference standards for films in the nanometer range

: Hasche, K.; Herrmann, K.; Krumrey, M.; Ulm, G.; Schädlich, S.; Frank, W.; Procop, M.

	European Society for Precision Engineering and Nanotechnology -EUSPEN-: Euspen 2nd International Conference 2001. Proceedings Turin, 2001 S.396-399
	European Society for Precision Engineering and Nanotechnology (International Conference) <2, 2001, Turin>

	Englisch
	Konferenzbeitrag
	Fraunhofer IWS ()
	Nanotechnologie; nm-Präzisionsschicht; mechanische Schichtcharakterisierung; Röntgenoptik; PVD; Optik; Geometrie; Rauhigkeit; Topographie; Schichtdicke; Spektroskopie; Schicht; Multischicht; Nanomaterialien; Grenzfläche

Abstract
The paper refers to the development, manufacture and metrological evaluation of artifacts for the thickness of an ultra-thin film deposited on a substrate. The artifacts shall be applicable as metrological reference standards for the calibration of film thickness measurement systems like X-ray reflectometers or ellipsometers. This calibration shall contribute to consistent traceable measurement results.

: http://publica.fraunhofer.de/dokumente/N-5264.html