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Surface relief gratings manufactured by lithographic means being a candidate for VLT MOONS instrument’s main dispersers

: Harzendorf, T.; Michaelis, D.; Flügel-Paul, T.; Bianco, A.; Oliva, E.; Zeitner, U.


Navarro, R. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Advances in Optical and Mechanical Technologies for Telescopes and Instrumentation III : 10-15 June 2018, Austin, Texas, United States
Bellingham, WA: SPIE, 2018 (Proceedings of SPIE 10706)
ISBN: 978-1-5106-1966-1
ISBN: 978-1-5106-1965-4
Paper 1070621, 9 S.
Conference "Advances in Optical and Mechanical Technologies for Telescopes and Instrumentation" <3, 2018, Austin/Tex.>
Conference "Astronomical Telescopes and Instrumentation" <2018, Austin/Tex.>
Fraunhofer IOF ()

Surface relief gratings are well-established elements for high power laser applications, e.g. ultra-short pulse compression. A binary submicron period profile, realized by e-beam lithography and reactive ion beam etching in a dielectric material, is utilized for nearly one-hundred percent diffraction efficiency. Because these gratings are manufactured without any replication techniques, a high wave front accuracy and a low stray light background can be achieved. Spectroscopic applications require additional properties, i.e. a larger spectral bandwidth and Off-Littrow operation. We present new approaches for surface relief gratings realized either via multi-level staircase profiles or exploiting sub-wavelength features. The RVS spectrometer grating in ESA’s GAIA mission is a prominent example where these techniques are already in use. The current contribution focuses on the results achieved during a pre-development performed for the MOONS instrument intended to operate at VLT.