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Accurate determination of 3D PSF and resist effects in grayscale laser lithography

: Onanuga, T.; Kaspar, C.; Sailer, H.; Erdmann, A.


Behringer, U.F.W. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
34th European Mask and Lithography Conference 2018 : 18-20 June 2018, Grenoble, France
Bellingham, WA: SPIE, 2018 (Proceedings of SPIE 10775)
ISBN: 978-1-5106-2121-3 (Print)
ISBN: 978-1-5106-2122-0
Paper 107750I, 7 S.
European Mask and Lithography Conference <34, 2018, Grenoble>
Fraunhofer IISB ()

Accurate calibration of the optical and resist parameters is invaluable for the computation of the dose distribution needed to fabricate a desired non-binary photoresist topography. This paper presents a method for precisely evaluating the 3D point spread function (PSF) and model parameters for the resist processes in laser grayscale lithography. The 3D PSF and resist model parameters were determined by fitting a detailed model of the grayscale process to experimental measurements of an array of test patterns. Measuring the entire 3D profile provides more data for process calibration, and therefore a more accurate model. The derived model parameters were applied to correctly predict the topography of sawtooth patterns.