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A single layer negative tone lift-off photo resist for patterning a magnetron sputtered Ti/Pt/Au contact system and for solder bumps

: Töpper, M.; Voigt, A.; Heinrich, M.; Hauck, K.; Mientus, R.; Gruetzner, G.; Ehrmann, O.


Kruit, P.:
Micro and Nano Engineering 2004. Proceedings of the 30th International Conference on Micro and Nano Engineering : September 19 - 22, 2004, Rotterdam, The Netherlands
Amsterdam: Elsevier, 2005 (Microelectronic engineering 78/79.2005)
International Conference on Micro and Nano Engineering (MNE) <30, 2004, Rotterdam>
Fraunhofer IZM ()

In this paper, we present the suitability of easy to handle negative tone photoresists providing examples of lift-off applications. The lithographic process of this single layer resist system requires standard broadband or i-line process conditions. At first, the capability to obtain an undercut pattern and the thermal stability of the resist ma-N 1400 is demonstrated in the lift-off patterning of magnetron sputtered thin three layer contact system Ti/Pt/Au. Temperature of the substrate during sputtering was measured time-resolved using a thermal couple. Secondly, an example to achieve AuSn solder bumps of 7.5 µm diameter by a combination of sputtering and metal evaporation using the lift-off resist ma-N 400 is given. Regarding the further miniaturization of electronic devices, this process is a cost-effective method to achieve solder depots for flip chip bonding of ultra thin chips.