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Development of functional ceramic films for nano and microsystems technology

: Schönecker, A.; Gebhardt, S.; Schlenkrich, F.; Endler, I.; Mayer-Uhma, T.; Uhlig, S.


TU Dresden, Institut für Aufbau- und Verbindungstechnik der Elektronik -IAVT-; Institute of Electrical and Electronics Engineers -IEEE-:
1st Electronics Systemintegration Technology Conference, ESTC 2006. Vol.2 : Dresden, 5.-7.9.2006
New York, NY: IEEE, 2006
ISBN: 1-4244-0552-1
ISBN: 1-4244-0553-X
Electronics Systemintegration Technology Conference (ESTC) <1, 2006, Dresden>
Fraunhofer IKTS ()
elemental semiconductors; glass ceramic; micromechanical devices; silicon

Ceramic films are considered as key functional material in nano and microsystems technology. IKTS has built the experimental basis for the development of functional films using screen printing, CSD, CVD, PVD, RIE and CMP, covering a wide range of chemical composition, film thickness and processing windows. Substrates of interest are those, forming the integration basis of microsystems, like Silicon (Si) wafers and glass ceramics (LTCC). The present paper is going to discuss the availability of various ceramics films for the design, development and fabrication of advanced nano and microsystems.