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Plasma characterization tools and application to reactive sputtering of Al-doped ZnO thin films

 
: Sittinger, V.; Ruske, F.; Szyszka, B.; Wiese, R.; Kersten, H.

Glass coatings. Products, technology, applications (2006), Nr.1, S.46-50
Englisch
Zeitschriftenaufsatz
Fraunhofer IST ()

Abstract
While magnetron sputtering is a commonly used tool for deposition of thin films in research and production, the development of suitable models describing film growth on the substrate progress slowly. One of the major reasons is the complexity of the process, in which energy and particles are delivered to the substrate in a variety of ways. Nevertheless, these effects are essential for film growth and will determine the quality of obtained films. In this article, an example for characterization of a deposition process with compareably simple and cost effective tools is shown. Total energy flux to the substrate is measured by a termal probe, electron irradiation is studied by means of Langmuir probe measurements and positive ions are measured by a retarding field analyzer. The results help to understand the principles of film growth and give insights on thermal load onto substrates during deposition. This information is essential when coatings have to be applied to heat-sensitive substrates.

: http://publica.fraunhofer.de/dokumente/N-51361.html