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Bulk scattering properties of synthetic fused silica at 193 nm

: Schröder, S.; Kamprath, M.; Duparre, A.; Tünnermann, A.; Kühn, B.; Klett, U.

Postprint (271 KByte; PDF; )

Optics Express 14 (2006), Nr.22, S.10537-10549
ISSN: 1094-4087
Zeitschriftenaufsatz, Elektronische Publikation
Fraunhofer IOF ()
excimer laser; scattering measurement; optical material; silica

The bulk scattering of synthetic fused silica for 193 nm lithography was investigated using an instrument for high-sensitive total and angle resolved scattering measurements at 193 nm. Bulk scattering coefficients alpha between 0.6x10-3 and 1.7x10-3 cm-1 (base e) depending on the hydroxyl (OH) content and fictive temperature of the samples were measured using a total scattering (TS) technique. The results are interpreted with regard to a model which relates scattering in fused silica to structural disorder in the material. From angle resolved scatter (ARS) measurements at 193 nm, a Rayleigh type scattering distribution was found. Using TS and ARS at 633 nm, 532 nm, and 325 nm in addition to the results at 193 nm, wavelength scaling about n8/lambda 4 as predicted by theory is obtained. Thus, the model is demonstrated to hold from the visible spectral range down to the deep ultraviolet.