Publica
Hier finden Sie wissenschaftliche Publikationen aus den FraunhoferInstituten. Parallel DSMC gasflow simulation of an inline coater for reactive sputtering
 Mohr, B.: Recent advances in parallel virtual machine and message passing interface : 13th European PVM, MPI User's Group Meeting, Bonn, Germany, September 1720, 2006; Proceedings Berlin: Springer, 2006 (Lecture Notes in Computer Science 4192) ISBN: 354039110X ISBN: 9783540391104 S.383390 
 European PVM/MPI Users' Group Meeting <13, 2006, Bonn> 

 Englisch 
 Konferenzbeitrag 
 Fraunhofer IST () 
Abstract
There is an increasing demand for high precision coatings on large areas via inline reactive sputtering, which requires advanced process control techniques. Thus, an improved theoretical understanding of the reactive sputtering process kinetics is mandatory for further technical improvement. We present a detailed Direct Simulation Monte Carlo (DSMC) gas flow model of an inline sputtering coater for large area architectural glazing. With this model, the pressure fluctuations caused by a moving substrate are calculated in comparison with the experiment. The model reveals a significant phase shift in the pressure fluctuations between the areas above the center and the edges of the substrate. This is a geometric effect and is e. g. independent of the substrate travelling direction. Consequently, a long sputtering source will observe pressure fluctuations at its center and edges, which are out of phase. For a heuristic model of the reactive sputtering process, we show that in certain cases a twodimensional model treatment is sufficient for predicting the film thickness distribution on the moving substrate. In other cases, a strong phase shift between averaged pressure fluctuations and reactive sputtering process response is observed indicating that a threedimensional model treatment is required for a realistic simulation of the inline deposition process.