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EUV multilayer optics

 
: Feigl, T.; Yulin, S.; Benoit, N.; Kaiser, N.

:

Loeschner, H.:
31st International Conference on Micro- and Nano-Engineering 2005. Proceedings : 19 - 22 September 2005, Vienna, Austria
Amsterdam: Elsevier, 2006 (Microelectronic engineering 83.2006,4/9)
S.703-706
International Conference on Micro- and Nano-Engineering (MNE) <31, 2005, Vienna>
Englisch
Konferenzbeitrag, Zeitschriftenaufsatz
Fraunhofer IOF ()
EUVL; broadband; magnetron sputtering; Mo/Si; multilayer mirror; narrowband; optic

Abstract
According to the optics requirements of an EUVL tool, the accurate deposition of high reflective and laterally graded multilayers on ultraprecise polished substrates can be regarded as one of the major challenges of EUV lithography development today. To meet these requirements, a new dc magnetron sputtering system NESSY and technologies to coat laterally graded EUV mulitlayers on curved optics were developed. The major characteristics of the deposition tool results of sputtered multilayer optics are presented in this paper.

: http://publica.fraunhofer.de/dokumente/N-50414.html