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Levet-set-based inverse lithography under random field shape uncertainty in a vector Hopkins imaging model

 
: Wu, X.; Fühner, T.; Erdmann, A.; Lam, E.Y.

:

Optical Society of America -OSA-, Washington/D.C.:
Computational Optical Sensing and Imaging : Part of Imaging and Applied Optics; 26-29 June 2017, San Francisco, California, United States
Washington, DC: OSA, 2017
ISBN: 978-1-943580-29-3
Paper CW1B.4
Conference "Computational Optical Sensing and Imaging" (COSI) <2017, San Francisco/Calif.>
Imaging and Applied Optics Congress <2017, San Francisco/Calif.>
Englisch
Konferenzbeitrag
Fraunhofer IISB ()

Abstract
This paper describes an approach to incorporate a random field uncertainty in level-set-based inverse lithography in a vector imaging model. It is expected that the approach can improve the robustness of the photomask evaluated by MEEF.

: http://publica.fraunhofer.de/dokumente/N-502840.html