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TiOx deposited by magnetron sputtering

A joint modelling and experimental study
: Tonneau, R.; Moskovkin, P.; Pflug, A.; Lucas, S.


Journal of Physics. D. Applied Physics 51 (2018), Nr.19, Art. 195202, 17 S.
ISSN: 0022-3727
ISSN: 1361-6463
Fraunhofer IST ()
plasma modelling; Monte Carlo simulation; reactive magnetron sputtering; film growth; titanium oxide; thin film

This paper presents a 3D multiscale simulation approach to model magnetron reactive sputter deposition of TiOx≤₂ at various O2 inlets and its validation against experimental results. The simulation first involves the transport of sputtered material in a vacuum chamber by means of a three-dimensional direct simulation Monte Carlo (DSMC) technique. Second, the film growth at different positions on a 3D substrate is simulated using a kinetic Monte Carlo (kMC) method. When simulating the transport of species in the chamber, wall chemistry reactions are taken into account in order to get the proper content of the reactive species in the volume. Angular and energy distributions of particles are extracted from DSMC and used for film growth modelling by kMC. Along with the simulation, experimental deposition of TiOx coatings on silicon samples placed at different positions on a curved sample holder was performed. The experimental results are in agreement with the simulated ones. For a given coater, the plasma phase hysteresis behaviour, film composition and film morphology are predicted. The used methodology can be applied to any coater and any films. This paves the way to the elaboration of a virtual coater allowing a user to predict composition and morphology of films deposited in silico.