Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

Management of metallic contamination in advanced IC manufacturing

 
: Danel, A.; Renaud, D.; Besson, P.; Bigot, C.; Grouillet, A.; Claes, M.; Bearda, T.; Frickinger, J.

Ruzyllo, J. ; Electrochemical Society -ECS-, Electronics and Photonics Division; Electrochemical Society -ECS-, Dielectric Science and Technology Division:
Cleaning technology in semiconductor device manufacturing IX : The Ninth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, held during the fall meeting of the Electrochemical Society in Los Angeles, California in October 2005
Pennington: Electrochemical Society, 2005 (ECS transactions 1,3)
S.3-10
International Symposium on Cleaning Technology in Semiconductor Device Manufacturing <9, 2005, Los Angeles/Calif.>
Electrochemical Society (Fall Meeting) <208, 2005, Los Angeles/Calif.>
Englisch
Konferenzbeitrag
Fraunhofer IISB ()

: http://publica.fraunhofer.de/dokumente/N-49272.html