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Promising plasma textured black silicon at etch temperatures > 0 °C for PV applications

 
: Gaudig, M.; Hirsch, J.; Ziegler, J.; Lausch, D.; Sprafke, A.N.; Bernhard, N.; Wehrspohn, R.B.

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Optical Society of America -OSA-, Washington/D.C.:
Optical nanostructures and advanced materials for photovoltaics : Part of light, energy and the environment; from the session Ordered and Disordered Structures for Light Management (PTh2A), Leipzig, 14-17 November 2016
Washington, DC: OSA, 2016
ISBN: 978-0-9600380-4-6
Paper PTh3A.3
Conference "Optical Nanostructures and Advanced Materials for Photovoltaics" <2016, Leipzig>
Conference "Light, Energy and the Environment" <2016, Leipzig>
Englisch
Konferenzbeitrag
Fraunhofer CSP ()
Fraunhofer IMWS ()

Abstract
Maskless plasma texturing, as an outstanding method to fabricate highly antireflective silicon surfaces, is optimized at etch temperatures above 0 °C. We achieve excellent optoelectronic properties suitable for silicon solar cell applications.

: http://publica.fraunhofer.de/dokumente/N-490937.html