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Simplified resist models for efficient simulation of contact holes and line ends
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2005
Conference Paper
Titel
Simplified resist models for efficient simulation of contact holes and line ends
Author(s)
Tollkühn, B.
Erdmann, A.
Semmler, A.
Nölscher, C.
Hauptwerk
Micro and Nano Engineering 2004. Proceedings of the 30th International Conference on Micro and Nano Engineering
Konferenz
International Conference on Micro and Nano Engineering (MNE) 2004
DOI
10.1016/j.mee.2004.12.065
Language
English
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Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB