Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

Easy plating - study on contact interface properties of parasitic plating-free Ni/Cu solar cells

 
: Grübel, B.; Büchler, A.; Kluska, S.; Bartsch, J.; Cimiotti, G.; Brand, A.A.; Glatthaar, M.

:
Volltext urn:nbn:de:0011-n-4774525 (595 KByte PDF)
MD5 Fingerprint: bfcf09948652c919cd397cdd02b04638
Erstellt am: 2.2.2018


Smets, A.:
33rd European Photovoltaic Solar Energy Conference and Exhibition, EU PVSEC 2017 : Proceedings of the international conference held in Amsterdam, The Netherlands, 25 September - 29 September 2017
München: WIP, 2017
ISBN: 978-3-936338-47-8
ISBN: 3-936338-47-7
S.970-974
European Photovoltaic Solar Energy Conference and Exhibition (EU PVSEC) <33, 2017, Amsterdam>
Englisch
Konferenzbeitrag, Elektronische Publikation
Fraunhofer ISE ()
Solarzellen - Entwicklung und Charakterisierung; Photovoltaik; Silicium-Photovoltaik; Kontaktierung und Strukturierung; annealing; contact; metallization; Plating; solar cell

Abstract
The Easy Plating process sequence is an elegant way to produce Al-BSF or PERC solar cells with laser-structured Ni/Cu-plated contacts. By eliminating the HF-treatment before metal deposition one can avoid parasitic plating at defects of the anti-reflection coating by utilizing native oxide growth to passivate these defects. Recent work demonstrated a significant improvement in terms of metal recombination, optical shading and aesthetical appearance compared to the standard plating approach. However, the Easy Plating sequence is sensitive to laser-induced and native oxide formation at the Si/Ni interface in the laser defined local contact openings. This work investigates the influence of interface oxides between the Si/Ni layer and the beneficial impact of the thermal anneal for the contact resistance. Therefore, the contact resistance is studied by transmission line measurement (TLM) and SEM is applied for visualization of silicides. Our findings are important for advanced process optimization and an advanced understanding of the processes at the interface.

: http://publica.fraunhofer.de/dokumente/N-477452.html