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Microstructural investigations of polycrystalline Ti2AlN prepared by physical vapor deposition of Ti-AlN multilayers

: Gröner, Lukas; Kirste, Lutz; Oeser, Sabine; Fromm, Alexander; Wirth, Marco; Meyer, Frank; Burmeister, Frank; Eberl, Chris

Postprint urn:nbn:de:0011-n-4708339 (1.6 MByte PDF)
MD5 Fingerprint: 78e253226e7b6aefa06381442f553fed
Erstellt am: 15.06.2020

Surface and coatings technology 343 (2018), S.166-171
ISSN: 0257-8972
Zeitschriftenaufsatz, Elektronische Publikation
Fraunhofer IWM ()
Fraunhofer IAF ()
MAX phase; Ti2AlN; PVD; multilayer deposition; microstructure

Ti2AlN is a prominent ternary nitride and belongs to the class of nanolaminated Mn + 1AXn phase materials which combine metallic and ceramic properties. In this work we report on the successful synthesis of polycrystalline Ti2AlN thin films with a preferential (000l) orientation on a polycrystalline Al2O3 substrate by depositing multiple Ti-AlN double layers and applying a subsequent annealing step. Investigations with scanning electron microscopy (SEM), X-ray diffraction (XRD), electron back scatter diffraction (EBSD) and Raman spectroscopy reveal a successful transformation of the multilayer system into a polycrystalline and dense Ti2AlN coating with a thickness of 2.7 μm. The observed grains are plate-like shaped with an in-plane size of about 100 to 300 nm and a thickness of 30 to 60 nm. Furthermore EBSD measurements proof that these macroscopic grains have a preferred orientation in the [000l] direction. We believe that a (000l)-textured microstructure will lead to new applications for protective coatings on polycrystalline substrates.