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Characterization of pellicle membranes by lab-based spectroscopic reflectance and transmittance measurements in the extreme ultraviolet

: Bahrenberg, L.; Danylyuk, S.; Brose, S.; Pollentier, I.; Timmermans, M.; Gallagher, E.; Stollenwerk, J.; Loosen, P.


Gargini, P. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
International Conference on Extreme Ultraviolet Lithography 2017 : 11-14 September 2017, Monterey, California
Bellingham, WA: SPIE, 2017 (Proceedings of SPIE 10450)
Paper 104501L, 7 S.
International Conference on Extreme Ultraviolet Lithography <2017, Monterey/Calif.>
Fraunhofer ILT ()

In this paper, studies on the characterization of pellicle membranes with a lab-based spectroscopic reflectometer operated in the extreme ultraviolet (EUV) spectral range from 8.7 nm to 15 nm are presented. This includes the actinic wavelength of EUV lithography at 13.5 nm for high volume manufacturing as well as its neighboring spectral bands. The tool can perform spectroscopic measurements of reflectance under adjustable incidence angles of grazing illumination, ranging from 5° to 12°. Additionally, spectroscopic measurements of transmittance under normal incidence for thin membranes ⪅ 100 nm can be performed. By acquisition of a data set of transmittance and reflectance values, membranes are characterized with respect to their optical constants and their dimensional parameters such as thickness and roughness by means of reconstruction. From reconstructed optical constants further properties such as density and stoichiometry can be derived.