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Gas flow sputtering for manufacture of high-quality hard magnetic films

 
: Bandorf, R.; Gröninger, A.; Ortner, K.; Gerdes, H.; Bräuer, G.

:

Lampert, Carl M. (Ed.) ; Society of Vacuum Coaters -SVC-, Albuquerque/NM:
Society of Vacuum Coaters. 59th Annual Technical Conference Proceedings : May 9-13, 2016, Indianapolis, Indiana; Teil des SVC-TECHCON-Programms: Symposium on Leading-Edge Coating Technologies: High-Performance Films Shape Tomorrow's Products
Albuquerque: SVC, 2016
ISBN: 978-1-878068-36-1
S.108-112
Society of Vacuum Coaters (Annual Technical Conference) <59, 2016, Indianapolis/Ind.>
Symposium on Leading-Edge Coating Technologies - High-Performance Films Shape Tomorrow's Products <2016, Indianapolis/Ind.>
Englisch
Konferenzbeitrag
Fraunhofer IST ()

Abstract
Sputter deposition of magnetic materials is challenging. In the case of soft magnetic materials, thin targets and strong magnetic arrays of sputtering cathode are usually used for effective magnetron sputtering. In the case of a hard magnetic material, the situation is different. The magnetic field lines are closed in to the target, and the magnetron effectively behaves as a diode sputtering system. In contrast, hollow cathode processes require no magnets to enhance ionization. Therefore, high rate deposition of hard magnetic films becomes possible with hollow cathodes.

: http://publica.fraunhofer.de/dokumente/N-464325.html