Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

Planar langmuir probe investigations of metallic and reactive bipolar sputtered aluminum

 
: Bandorf, R.; Gerdes, H.; Barati, V.; Bräuer, G.

:

Lampert, Carl M. (Ed.) ; Society of Vacuum Coaters -SVC-, Albuquerque/NM:
Society of Vacuum Coaters. 59th Annual Technical Conference Proceedings : May 9-13, 2016, Indianapolis, Indiana; Teil des SVC-TECHCON-Programms: Symposium on Leading-Edge Coating Technologies: High-Performance Films Shape Tomorrow's Products
Albuquerque: SVC, 2016
ISBN: 978-1-878068-36-1
S.486-490
Society of Vacuum Coaters (Annual Technical Conference) <59, 2016, Indianapolis/Ind.>
Symposium on Leading-Edge Coating Technologies - High-Performance Films Shape Tomorrow's Products <2016, Indianapolis/Ind.>
Englisch
Konferenzbeitrag
Fraunhofer IST ()

Abstract
Plasma diagnostics are a very useful tool for characterizing the main parameters ofsputtering plasmas like electron density, electron temperature, or ion density. These parameters can be determined at the substrate position by the use of a Langmuir probe. This paper focuses on time-averaged and time-resolved planar Langmuir probe measurements. As a model system, a dual-magnetron configuration using two cylindrical aluminum cathodes was used. The planar Langmuir probe was placed in three substrate positions, one between the two rotatable targets and another directly in front of each target. The results differed significantly due to the physical position of the probe relative to the magnetrons. For the middle position each single pulse applied to one of the cathodes is detected by the Langmuir probe separately. Positioning the probe in front of one of the cathodes shows only one peak for the ion current for a full bipolar cycle. This was attributed to constructive superposition of the different distances between the probe and both targets. Moving from metallic to reactive sputtering caused the electron temperature to drop significantly. Finally, a correlation between the plasma parameters and film properties of alumina (Al₂O₃) coatings was presented.

: http://publica.fraunhofer.de/dokumente/N-464324.html