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VERFAHREN ZUR ABSCHEIDUNG VON AMORPHEN, WASSERSTOFFHALTIGEN SILIZIUMSCHICHTEN

Coating substrate with amorphous hydrogen-containing silicon layers used in production of solar cells comprises introducing sputtering gas and reactive gas.
 
: Szyszka, B.; Klages, C.; Jiang, X.; Jung, T.

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Frontpage ()

DE 2000-10011857 A: 20000310
EP 2001-936062 A: 20010308
EP 1264000 A1: 20021211
C23C0014
Deutsch
Patent, Elektronische Publikation
Fraunhofer IST ()

Abstract
WO 200166815 A UPAB: 20011108 NOVELTY - Coating a substrate (1) with amorphous hydrogen-containing silicon layers (a-Si: H layers) (7) comprises introducing a sputtering gas and a reactive gas containing silicon or a silicon compound into a gas flow sputtering source (8) with a target that contains silicon. DETAILED DESCRIPTION - Preferred Features: A hollow cathode gas flow sputtering source is used as the gas flow sputtering source. The reactive gas is SiH4 or Si2H6, optionally mixed with additional reactive gas. A noble gas is introduced into the sputtering source as sputtering gas. USE - Used in the production of solar cells. ADVANTAGE - Good a-Si: H layers are produced in an in-line process.

: http://publica.fraunhofer.de/dokumente/N-44885.html