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Large area precision coatings by pulse magnetron sputtering

: Frach, Peter; Glöß, Daniel; Goschurny, Thomas; Drescher, Andy; Hartung, Ullrich; Bartzsch, Hagen; Heisig, Andreas; Grune, Harald; Leischnig, L.; Leischnig, S.; Bundesmann, C.


Vizgaitis, J.N. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Advanced Optics for Defense Applications: UV through LWIR II : Anaheim, California, United States, April 9, 2017
Bellingham, WA: SPIE, 2017 (Proceedings of SPIE 10181)
Paper 101810K, 7 S.
Conference "Advanced Optics for Defense Applications" <2017, Anaheim/Calif.>
Fraunhofer FEP ()
optical filters; large area; pulse magnetron sputtering; reactive sputtering; backlight

Pulse magnetron sputtering is very well suited for the deposition of optical coatings. Due to energetic activation during film growth, sputtered films are dense, smooth and show an excellent environmental stability. Films of materials likeSiO2, Al2O3, Nb2O5 or Ta2O5 can be produced with very little absorption and scattering losses and are well suited for precision optics. FEP's coating plant PreSensLine, a deposition machine dedicated for the development and deposition of precision optical layer systems will be presented. The coating machine (VON ARDENNE) is equipped with dual magnetron systems (typeRM by FEP). Concepts regarding machine design, process technology and process control as well as in situ monitoring are presented to realize the high demands on uniformity, accuracy and reproducibility. Results of gradient and multilayer type precision optical coatings are presented. Application examples are edge filters and special antireflective coatings for the backlight of 3D displays with substrate size up to 300 x 400mm. The machine allows deposition of rugate type gradient layers by rotating a rotary table with substrates between two sources of the dual magnetron system. By combination of the precision drive (by LSA) for the substrate movement and a special pulse parameter variation during the deposition process (available with the pulse unit UBS-C2 of FEP), it is possible to adjust the deposition rate as a function of the substrate position exactly. The aim of a current development is a technology for the uniform coating of3D-substrates and freeform components as well as laterally graded layers.