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Automated source/mask/directed self-assembly optimization using a self-adaptive hierarchical modeling approach

: Fühner, T.; Michalak, P.; Wu, X.; Erdmann, A.


Bär, E. ; Institute of Electrical and Electronics Engineers -IEEE-; Deutsche Forschungsgemeinschaft -DFG-, Bonn:
International Conference on Simulation of Semiconductor Processes and Devices, SISPAD 2016 : September 6-8, 2016, Nuremberg, Germany
Piscataway, NJ: IEEE, 2016
ISBN: 978-1-5090-0818-6 (Online)
ISBN: 978-1-5090-0816-2 (CD-ROM)
ISBN: 978-1-5090-0819-3
ISBN: 978-1-5090-0817-9
International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) <2016, Nuremberg>
Fraunhofer IISB ()

We propose an integrated approach to optimize lithography-generated guide structures for the directed self-assembly (DSA) of block co-polymers. Modeling the entire lithography/DSA co-process, little a priori knowledge is required, and well-performing solutions can be obtained quasi-automatically. To maintain a feasible optimization runtime, a reduced DSA model is employed. Predictivity and stability are ensured by the introduction of a self-adaptive calibration and model correction routine, for which a more exact phase-field DSA model is used. By an application to a via multiplication example, the feasibility and the potentials of the approach are demonstrated and discussed.