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Large area manufacturing of plasmonic colour filters using substrate conformal imprint lithography

: Rumler, Maximilian; Foerthner, M.; Baier, L.; Evanschitzky, P.; Becker, M.; Rommel, M.; Frey, L.


Nano Futures 1 (2017), Nr.1, Art. 015002, 13 S.
ISSN: 2399-1984
Fraunhofer IISB ()
nanoimprint lithography; soft lithography; plasmonics; colour filter

This work presents the large area fabrication of plasmonic colour filters consisting of subwavelength apertures in aluminium films of different thicknesses. Wafer-scale pattern transfer was realized by a soft lithography technique (substrate conformal imprint lithography). The fabricated colour filters have an active area of up to 145 cm2 which presents a considerable increase compared to previously published results. In addition to experimental investigations, simulations of the transmission behaviour were performed using a rigorous electromagnetic field solver based on an extendedRCWA approach. Furthermore, the use of a spin-coated cover layer consisting of the UV-curable hybrid polymer OrmoComp® instead of often applied PECVD-SiO2 was investigated.